The English version of
An Introduction to Ion Beam Biotechnology, a monograph authored by Prof. YU Zengliang from the CAS Institute of Plasma Physics in Hefei has recently been published by the preeminent publisher Springer in New York.
Since their discovery on the biological effect of ion implantation in the late 1980s, Prof. Yu and his team have independently opened up new horizons in the application of low-energy ion beams. Their work has been honored with an Award for Outstanding Chinese Patented Inventions from the World Intellectual Property Organization and the State intellectual Property Office of China.
The book presents a comprehensive primer on radiation-induced mutations and implantation of charged particles altering biological development. It covers the physics of ions particles, the biological effects of ion implantations in cells, and the subsequent use in bacteria, in viruses, and in plants, and is considered as one of the most intriguing and leading tools in bioengineering cells.
Experts say the publication of the book signifies CAS scientists are at the cutting edge of the research field. Prof. Yu and his lab have opened a fascinating novel area for ion beam, notes Dr. I. Brown, one of the translators of the book from the US State Laboratory at Berkeley. "They have been the lading team in the world in this field. Their work shows unlimited application potentials of the ion technique which may better serve the human being," he addes.
